TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Four Chongqing Chemdad Co. ，Ltd

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TRIS(DIMETHYLAMIDO)GALLIUM(III) 98

CAS No.：57731-40-5

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TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Basic information

Product Name:	TRIS(DIMETHYLAMIDO)GALLIUM(III) 98
Synonyms:	Bis[miu-(N-Methylmethanaminato)]tetrakis(N-methylmethanaminato)digallium;Hexakis(dimethylamido)digallium;Tris(dimethylamino)gallane;Bis(diMethylaMino)tetrakis(diMethylaMino)digalliuM,98%;Tris(diMethylaMino)galliuM(III) diMer, 99.9% (Metals basis);tris(dimethylamido)gallium(iii);TRIS(DIMETHYLAMIDO)GALLIUM(III) 98;Tris(dimethylamino)gallium(III) dimer
CAS:	57731-40-5
MF:	C12H36Ga2N6
MW:	403.91
EINECS:	200-287-4
Product Categories:	GalliumVapor Deposition Precursors;Catalysis and Inorganic Chemistry;Chemical Synthesis;Gallium;Precursors by Metal;organometallic complex
Mol File:	57731-40-5.mol

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Chemical Properties

Melting point	104-105.5 °C(lit.)
Boiling point	55.7 °C760 mm Hg
Fp	56 °C
form	crystal
color	white
Water Solubility	Miscible with Water.
Sensitive	Moisture Sensitive

Safety Information

Hazard Codes	F,C
Risk Statements	11-14-34
Safety Statements	16-26-36/37/39-45
RIDADR	UN 2925 4.1/PG 2
WGK Germany	3
HazardClass	4.3

MSDS Information

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Usage And Synthesis

Uses	Tris(dimethylamido)gallium(III) can be used in the following fields: Reagent used for the growth of gallium oxide films via the reaction with alcohols or water. Complex used for the ALD of gallium oxide films. Complex used in a new pyrolysis route to GaN quantum dots. Complex used for the generation of monodispersed, colloidal gallium nanoparticles. Complex used for the atomic layer deposition of gallium sulfide films.
Uses	Gallium nitride film precursor. Used as Reagent.
General Description	Atomic number of base material: 31 Gallium

TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Preparation Products And Raw materials

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