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| TRIS(DIMETHYLAMINO)SILANE Basic information |
| Product Name: | TRIS(DIMETHYLAMINO)SILANE | | Synonyms: | TRIS(DIMETHYLAMINO)SILANE;n,n,n’,n’,n’’,n’’-hexamethyl-silanetriamin;n,n,n’,n’,n’’,n’’-hexamethylsilanetriamine;N,N,N’,N’,N’’,N’’-hexamethyl-Silanetriamine;TRIS(DIMETHYLAMINO)SILANE 99+%;N,N',N''-(Silanetriyl)tris(dimethylamine);N,N',N''-Silanetriyltris(dimethylamine);TRIS(DIMETHYLAMINO)SILANE, 99.9+% | | CAS: | 15112-89-7 | | MF: | C6H19N3Si | | MW: | 161.32 | | EINECS: | 239-165-0 | | Product Categories: | ALD Precursors;organosilicon compounds | | Mol File: | 15112-89-7.mol |
| TRIS(DIMETHYLAMINO)SILANE Chemical Properties |
| Melting point | <0°C | | Boiling point | 145 °C | | density | 0,838 g/cm3 | | refractive index | 1.4247 | | Fp | 25°C | | form | liquid | | pka | 10.93±0.70(Predicted) | | color | colorless to light yellow | | Specific Gravity | 0.84 | | Hydrolytic Sensitivity | 8: reacts rapidly with moisture, water, protic solvents | | Sensitive | air sensitive, moisture sensitive | | EPA Substance Registry System | N,N,N',N',N'',N''-Hexamethylsilanetriamine (15112-89-7) |
| TRIS(DIMETHYLAMINO)SILANE Usage And Synthesis |
| Uses | Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor. | | General Description | Please inquire for quantity, pricing, and packaging options. |
| TRIS(DIMETHYLAMINO)SILANE Preparation Products And Raw materials |
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